Principles and Practice of Thin-Film Deposition: Fundamentals, Process Engineering, Industrial Applications PVD, CVD, ALD, Sputtering Technologies

Prix à partir de
148,55

Liens sponsorisés

COMPARER TOUS LES MAGASINS EN LIGNE (2)

Description

Principles and Practice of Thin-Film Deposition: Fundamentals, Process Engineering, Industrial Applications PVD, CVD, ALD, Sputtering Technologies

Description Description
Product Specifications Spécifications du produit
Résultats connexes Résultats connexes
Next
Previous

Comparer les boutiques en ligne (2)

Liens sponsorisés · Certaines boutiques nous versent une rémunération

Trier par:

148,55 € Total 148,56 €

148,55 € Total 148,56 €

Description (0)

Principles and Practice of Thin-Film Deposition: Fundamentals, Process Engineering, Industrial Applications PVD, CVD, ALD, Sputtering Technologies

Spécifications du produit

Marque Independently Published
EAN
  • 9798186673842

Blackwell Verlag GmbH

Radio Frequency Sputtering: Thin Film Deposition and Device Applications

152,60 €
Comparer 2 magasins 2 magasins

CRC Press

Fundamentals of Additive Manufacturing: Principles, Technologies, and Applications

70,53 €
Comparer 2 magasins 2 magasins

Independently Published

Fundamentals of Vehicle Dynamics: Principles, Modeling, and Engineering Applications

108,89 €
Comparer 2 magasins 2 magasins

Independently Published

Fundamentals of Vehicle Dynamics: Principles, Modeling, and Engineering Applications

85,41 €
Comparer 2 magasins 2 magasins
Choix en vedette
148,55 €
Voir l’offre